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AwardedGermanyGoods

Clustertool for Ion Beam Etching of 300mm wafers

Published
Published 19 February 2026

Overview

Fraunhofer-Gesellschaft procured a clustertool for ion beam etching of 300mm wafers designed for CMOS wafer processing in a cleanroom environment at Fraunhofer IPMS, with requirements for metal contamination control and particle generation compatibility with industry standards. The contract was awarded to Scia Systems GmbH on 2 July 2026 and is now complete.

Key details

Country
Germany
Status
Awarded
Category
Goods
Procedure
Limited
SME suitable
No
Published
19 February 2026
Classification (CPV)
Miscellaneous general and special-purpose machinery

Award outcome

Awarded value
€1
Award date
2 July 2026
Contract period
1 December 2026 → 31 December 2026
Winner
  • Scia Systems GmbH

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Notice history

Every published notice in this contracting process, newest first.

  1. Contract Award Notice

    10 July 2026

  2. Contract Notice

    19 February 2026

Contracting authority

  • Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.

    Procuring entity

    Erlangen, Germany

    EU: 10342

    Authority website ↗

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Awarded: Clustertool for Ion Beam Etching of 300mm wafers — won by Scia Systems GmbH — Skim