AwardedGermanyGoods
Deep Reactive Ion Etching (DRIE) Si fluorine chemistry etcher
- Published
- Published 26 March 2026
- Deadline
- Closed 28 April 2026
Overview
Helmholtz-Zentrum Dresden-Rossendorf procured a Deep Reactive Ion Etching (DRIE) Si fluorine chemistry etcher from SENTECH Gesellschaft für Sensortechnik mbH, awarded on 9 June 2026. The equipment will provide deep trench etching and through-via capabilities for the IBC cleanroom to support magnetic nanodevice fabrication under the MagKI investment programme, with delivery, installation and site acceptance testing required by 1 June 2027, along with documentation in English and German, a two-year warranty, and operation in ISO Class 6 cleanroom environments.
Key details
- Country
- Germany
- Status
- Awarded
- Category
- Goods
- Procedure
- Open
- SME suitable
- No
- Published
- 26 March 2026
- Deadline
- Closed
Laboratory, optical and precision equipments (excl. glasses)
Award outcome
- Awarded value
- -€1
- Award date
- 9 June 2026
- Contract period
- — → 6 December 2026
- SENTECH Gesellschaft für Sensortechnik mbH
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Notice history
Every published notice in this contracting process, newest first.
Contract Award Notice
11 June 2026
Contract Notice
26 March 2026
Contracting authority
Helmholtz-Zentrum Dresden-Rossendorf e.V.
Procuring entityDresden, Germany
Authority website ↗
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