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AwardedGermanyGoods

Hotplate zur Temperung großflächiger Substrate für Elektronenstrahllithografie

Published
Published 14 April 2026
Deadline
Closed 19 May 2026

Overview

Friedrich-Schiller-Universität Jena procured a semi-automatic hotplate for tempering resist-coated substrates used in high-resolution electron beam lithography, capable of processing 300mm wafers and rectangular glass substrates up to 300×275×15mm with defined pre- and post-bake cycles for chemically amplified resists. The contract was awarded to Notion Systems GmbH on 30 June 2026 for €216,125.

Key details

Country
Germany
Status
Awarded
Category
Goods
Procedure
Open
SME suitable
No
Published
14 April 2026
Deadline
Closed
Classification (CPV)
Laboratory, optical and precision equipments (excl. glasses)

Award outcome

Awarded value
€216,125
Award date
30 June 2026
Winner
  • Notion Systems GmbH

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Notice history

Every published notice in this contracting process, newest first.

  1. Contract Award Notice

    2 July 2026

  2. Contract Notice

    14 April 2026

Contracting authority

  • Friedrich-Schiller-Universität Jena

    Procuring entity

    Jena, Germany

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Awarded: Hotplate zur Temperung großflächiger Substrate für Elektronenstrahllithografie — won by Notion Systems GmbH — Skim