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AwardedGermanyGoods

ICP- RIE Plasma Etching Tool (IAF 07c.1) - PR877552-2050-P

Published
Published 11 August 2025

Overview

ICP- RIE Plasma Etching Tool (IAF 07c.1)

Key details

Country
Germany
Status
Awarded
Category
Goods
Procedure
Direct
Published
11 August 2025
Classification (CPV)
Miscellaneous general and special-purpose machinery

Award outcome

Awarded value
-€1
Award date
7 August 2025
Contract period
1 June 2026 → 5 June 2026
Winner
  • SENTECH Gesellschaft für Sensortechnik mbH

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Notice history

Every published notice in this contracting process, newest first.

  1. Contract Award Notice

    11 August 2025

Contracting authority

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Awarded: ICP- RIE Plasma Etching Tool (IAF 07c.1) - PR877552-2050-P — won by SENTECH Gesellschaft für Sensortechnik mbH — Skim