DEUCONTRACT_NOTICE

maskenloses UV-Direktlithographie-System

Published: Published 21 May 2026
Deadline: Closed 25 June 2026

Overview

The tender seeks to procure a compact, benchtop UV direct lithography system suitable for cleanroom use, intended for research, development, and small-series prototyping. The system must offer both raster-based full-field exposure and an additional vector-based direct exposure mode, enabling the creation of high-resolution micro- and nanostructures, repair of existing structures, and precise contour line exposures on a variety of substrates. The equipment must meet specified minimum requirements to ensure its suitability for these advanced applications.

Key details

Country: DEU
Notice type: CONTRACT_NOTICE
Published: 21 May 2026
Deadline: Closed
Contract lots: 1

Contract lots

maskenloses UV-Direktlithographie-System
Beschafft werden soll ein kompaktes, für den Reinraumeinsatz geeignetes Tischsystem zur maskenlo-sen UV-Direktlithographie für Forschung, Entwicklung und Kleinserien-Prototyping. Das System muss sowohl eine rasterbasierte Vollflächenbelichtung als auch einen zusätzlichen vektorbasierten Direkt-belichtungsmodus bereitstellen, um hochauflösende Mikro- und Nanostrukturen, Ausbesserungen bestehender Strukturen sowie konturtreue Linienbelichtungen auf unterschiedlichsten Substraten zu ermöglichen. Daraus ergeben sich folgende Mindestanforderungen: siehe Anlage 2.

Contracting authority

Friedrich-Schiller-Universität Jena
Jena, DEU

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